We report on a zone-doubling technique that bypasses the electron-beam lithography limitations for the production of X-ray diffractive optics and enables the fabrication of Fresnel zone plates with smaller outermost zone widths than other well-established approaches.We have applied this method to manufacture hard X-ray Fresnel zone plates with outermost zone widths of 25 and 20 nm. These lenses have been tested in scanning transmission X-ray microscopy (STXM) at energies up to 6.2 keV, producing images of test structures that demonstrate a spatial resolution of 25 nm. High spatial resolution STXM images of several biological specimens have been acquired in transmission, dark-field and differential phase contrast modes. © 2010 American Institute of Physics.
High spatial resolution STXM at 6.2 keV photon energy / Vila-Comamala, J.; Dierolf, M.; Kewish, C. M.; Thibault, P.; Pilvi, T.; Färm, E.; Guzenko, V.; Gorelick, S.; Menzel, A.; Bunk, O.; Ritala, M.; Pfeiffer, F.; David, C.. - ELETTRONICO. - 1221:(2010), pp. 80-84. ( 20th International Congress on X-ray Optics and Microanalysis, ICXOM20 Karlsruhe, deu 2009) [10.1063/1.3399261].
High spatial resolution STXM at 6.2 keV photon energy
Thibault P.;
2010-01-01
Abstract
We report on a zone-doubling technique that bypasses the electron-beam lithography limitations for the production of X-ray diffractive optics and enables the fabrication of Fresnel zone plates with smaller outermost zone widths than other well-established approaches.We have applied this method to manufacture hard X-ray Fresnel zone plates with outermost zone widths of 25 and 20 nm. These lenses have been tested in scanning transmission X-ray microscopy (STXM) at energies up to 6.2 keV, producing images of test structures that demonstrate a spatial resolution of 25 nm. High spatial resolution STXM images of several biological specimens have been acquired in transmission, dark-field and differential phase contrast modes. © 2010 American Institute of Physics.Pubblicazioni consigliate
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