The structure of the metal-oxide interface in the alumina/Ni3Al(111) system is investigated by comparing backscattering and forward-scattering photoelectron diffraction modulation functions of chemically nonequivalent aluminum and oxygen species with multiple-scattering simulations. We observe large relaxation effects at the metal-oxide interface layer: Al atoms of the Ni3Al alloy surface are lifted by more than 0.7 Å above the ideal termination, thus creating a new, metallic layer between the oxide and the alloy. The effect of the interface atomic rearrangement on the properties of the supported ultrathin alumina oxide film is discussed.
Large Interlayer Relaxation at a Metal-Oxide Interface:The Case of a Supported Ultrathin Alumina Film
VESSELLI, ERIK;BARALDI, Alessandro;COMELLI, GIOVANNI
2010-01-01
Abstract
The structure of the metal-oxide interface in the alumina/Ni3Al(111) system is investigated by comparing backscattering and forward-scattering photoelectron diffraction modulation functions of chemically nonequivalent aluminum and oxygen species with multiple-scattering simulations. We observe large relaxation effects at the metal-oxide interface layer: Al atoms of the Ni3Al alloy surface are lifted by more than 0.7 Å above the ideal termination, thus creating a new, metallic layer between the oxide and the alloy. The effect of the interface atomic rearrangement on the properties of the supported ultrathin alumina oxide film is discussed.Pubblicazioni consigliate
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