We present a study on the growth and characterization of high-quality single-layer MoS2 with a single orientation, i.e. without the presence of mirror domains. This single orientation of the MoS2 layer is established by means of x-ray photoelectron diffraction. The high quality is evidenced by combining scanning tunneling microscopy with x-ray photoelectron spectroscopy measurements. Spin- and angle-resolved photoemission experiments performed on the sample revealed complete spin- polarization of the valence band states near the K and -K points of the Brillouin zone. These ndings open up the possibility to exploit the spin and valley degrees of freedom

Epitaxial growth of single-orientation high-quality MoS2monolayers

Bana, Harsh
Membro del Collaboration Group
;
Travaglia, Elisabetta
Membro del Collaboration Group
;
Bignardi, Luca;Presel, Francesco
Membro del Collaboration Group
;
DE ANGELIS, DARIO
Membro del Collaboration Group
;
Baraldi, Alessandro
Membro del Collaboration Group
;
2018-01-01

Abstract

We present a study on the growth and characterization of high-quality single-layer MoS2 with a single orientation, i.e. without the presence of mirror domains. This single orientation of the MoS2 layer is established by means of x-ray photoelectron diffraction. The high quality is evidenced by combining scanning tunneling microscopy with x-ray photoelectron spectroscopy measurements. Spin- and angle-resolved photoemission experiments performed on the sample revealed complete spin- polarization of the valence band states near the K and -K points of the Brillouin zone. These ndings open up the possibility to exploit the spin and valley degrees of freedom
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11368/2928949
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