Epitaxial growth of single-orientation high-quality MoS2monolayers

We present a study on the growth and characterization of high-quality single-layer MoS2 with a single orientation, i.e. without the presence of mirror domains. This single orientation of the MoS2 layer is established by means of x-ray photoelectron diffraction. The high quality is evidenced by combining scanning tunneling microscopy with x-ray photoelectron spectroscopy measurements. Spin- and angle-resolved photoemission experiments performed on the sample revealed complete spin- polarization of the valence band states near the K and -K points of the Brillouin zone. These ndings open up the possibility to exploit the spin and valley degrees of freedom



Titolo: Epitaxial growth of single-orientation high-quality MoS2monolayers
Autori: 
BANA, HARSH VARDHAN [Membro del Collaboration Group]
TRAVAGLIA, ELISABETTA [Membro del Collaboration Group]
BIGNARDI, LUCA
PRESEL, FRANCESCO [Membro del Collaboration Group]
DE ANGELIS, DARIO [Membro del Collaboration Group]
BARALDI, Alessandro [Membro del Collaboration Group]
mostra contributor esterni 
Data di pubblicazione: 2018
Stato di pubblicazione: Pubblicato
Rivista: 
2D MATERIALS  
Abstract: We present a study on the growth and characterization of high-quality single-layer MoS2 with a single orientation, i.e. without the presence of mirror domains. This single orientation of the MoS2 layer is established by means of x-ray photoelectron diffraction. The high quality is evidenced by combining scanning tunneling microscopy with x-ray photoelectron spectroscopy measurements. Spin- and angle-resolved photoemission experiments performed on the sample revealed complete spin- polarization of the valence band states near the K and -K points of the Brillouin zone. These ndings open up the possibility to exploit the spin and valley degrees of freedom
Handle: http://hdl.handle.net/11368/2928949
Digital Object Identifier (DOI): http://dx.doi.org/10.1088/2053-1583/aabb74
URL: http://iopscience.iop.org/article/10.1088/2053-1583/aabb74/meta
https://arxiv.org/abs/1802.02220
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