This letter reports the experimental evidence of a 2.3 eV blue shift of the plasmon loss lines observed in the x-ray photoelectron spectra of an ultrathin Si layer equivalent to 1.5 X 10(15) at./cm(2) deposited onto a randomly oriented Al2O3 Single crystal. The plasmon line shifts, which is roughly proportional to the deposited Si(mass)(-2/3), are attributed to quantum confinement effects in agreement with electron energy loss measurements performed on nanosized Si particles.
POSSIBLE EVIDENCE OF QUANTUM-SIZE EFFECTS IN X-RAY PHOTOEMISSION SPECTRA OF ULTRATHIN SI LAYERS
PARMIGIANI, FULVIO
1995-01-01
Abstract
This letter reports the experimental evidence of a 2.3 eV blue shift of the plasmon loss lines observed in the x-ray photoelectron spectra of an ultrathin Si layer equivalent to 1.5 X 10(15) at./cm(2) deposited onto a randomly oriented Al2O3 Single crystal. The plasmon line shifts, which is roughly proportional to the deposited Si(mass)(-2/3), are attributed to quantum confinement effects in agreement with electron energy loss measurements performed on nanosized Si particles.File in questo prodotto:
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