The concept of self-regenerating or "smart" catalysts, developed to mitigate the problem of supported metal particle coarsening in high-temperature applications, involves redispersing large metal particles by incorporating them into a perovskite-structured support under oxidizing conditions and then exsolving them as small metal particles under reducing conditions. Unfortunately, the redispersion process does not appear to work in practice because the surface areas of the perovskite supports are too low and the diffusion lengths for the metal ions within the bulk perovskite too short. Here, we demonstrate reversible activation upon redox cycling for CH4oxidation and CO oxidation on Pd supported on high-surface-area LaFeO3prepared as a thin conformal coating on a porous MgAl2O4support using Atomic Layer Deposition (ALD). The LaFeO3film, less than 1.5-nm thick, was shown to be initially stable to at least 900 °C. The activated catalysts exhibit stable catalytic performance for methane oxidation after high-temperature treatment.
Smart Pd Catalyst with Improved Thermal Stability Supported on High-Surface-Area LaFeO3Prepared by Atomic Layer Deposition
Monai, Matteo;Montini, Tiziano;Fornasiero, Paolo;
2018-01-01
Abstract
The concept of self-regenerating or "smart" catalysts, developed to mitigate the problem of supported metal particle coarsening in high-temperature applications, involves redispersing large metal particles by incorporating them into a perovskite-structured support under oxidizing conditions and then exsolving them as small metal particles under reducing conditions. Unfortunately, the redispersion process does not appear to work in practice because the surface areas of the perovskite supports are too low and the diffusion lengths for the metal ions within the bulk perovskite too short. Here, we demonstrate reversible activation upon redox cycling for CH4oxidation and CO oxidation on Pd supported on high-surface-area LaFeO3prepared as a thin conformal coating on a porous MgAl2O4support using Atomic Layer Deposition (ALD). The LaFeO3film, less than 1.5-nm thick, was shown to be initially stable to at least 900 °C. The activated catalysts exhibit stable catalytic performance for methane oxidation after high-temperature treatment.File | Dimensione | Formato | |
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